Talk:Reactive-ion etching
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The second paragraph of the 'Equpiment' section has the following sentence: "Very high plasma densities can be achieved, though etch profiles tend to be more isotropic.". I believe this should be "less isotropic", but only from the sentence, not from my own knowledge. Can anyone weigh in on this one? Larryisgood (talk) 05:53, 20 November 2015 (UTC)
To expand the stub: I added the reference to the corresponding german wikipedia article, which is quite good. Perhaps somebody, who has English as mother tongue, is better able to translate it. -- mchelge 10/19/04
Scheme is false: It is the opposite —Preceding unsigned comment added by 193.149.15.15 (talk) 14:03, 27 July 2009 (UTC)
Yes, I think the plate connected to the RF generator (which is DC isolated) should have a negative potential ! -- Ocwikiver 29/08/09
And the ions have positive charge —Preceding unsigned comment added by 91.2.44.57 (talk) 07:08, 5 November 2009 (UTC)
Very true; the image is wrong. Electron mobility is much greater than ion mobility, which allows the electrode to get negatively charged. See explanation: http://books.google.nl/books?hl=en&lr=&id=bBjpoLsyycMC&oi=fnd&pg=PA196&dq=reactive+ion+etching&ots=Dyfu7yPEpG&sig=Mgh7YXmnJNyjYITanQLzwlEjFc8#v=onepage&q=reactive%20ion%20etching&f=false at page 196 —Preceding unsigned comment added by 131.180.150.169 (talk) 12:46, 4 January 2011 (UTC)
Method of Operation: Wrong explanation and wrong image as said before — Preceding unsigned comment added by 141.52.177.175 (talk) 10:21, 1 February 2012 (UTC)
Method of Operation: "typical" MHz and wattages stated are irrelevant. These values depend on the process and are not "typical" — Preceding unsigned comment added by 104.129.194.197 (talk) 18:58, 7 June 2018 (UTC)