Talk:ASML

Update

I have updated the ASML profile with information from ASML's corporate communication department. —Preceding unsigned comment added by Serge van Rooij (talk • contribs) (2007)

Abbreviation

Could someone give the correct meaning for the ASML abbreviaton. My guess: Advanced Semiconductor Materials Lithography 194.105.120.80 (talk) 08:04, 3 August 2010 (UTC)

Yes, it is. See here. Gr1st (talk) 18:20, 3 August 2010 (UTC)

Note: it's mentioned under "When was the company established": ...‘ASML’ became well known and became the official company name, so ‘ASM Lithography’ is no longer used. Han-Kwang (t) 14:22, 4 December 2011 (UTC)

Disclosure

Hereby, I disclose I am affiliated with ASML. However, my edits here do not necessarily represent the views of the company. Han-Kwang (t) 14:22, 4 December 2011 (UTC)

EUV throughput

55 wph in 2010 and 125 in wph 2015 are unsupported.——166.107.163.254 (talk) 01:35, 19 January 2017 (UTC) Unsupported material has been removed.—166.107.163.254 (talk) 01:01, 21 January 2017 (UTC)

Requested move 23 March 2026

The following is a closed discussion of a requested move. Please do not modify it. Subsequent comments should be made in a new section on the talk page. Editors desiring to contest the closing decision should consider a move review after discussing it on the closer's talk page. No further edits should be made to this discussion.

The result of the move request was: moved. Uncontroversial move, closing. (closed by non-admin page mover) PhotographyEdits (talk) 16:43, 28 March 2026 (UTC)

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ASML Holding → ASML – The WP:COMMONNAME is ASML and it is the WP:PRIMARYTOPIC for that name. Move the disambiguation page to ASML (disambiguation). PhotographyEdits (talk) 21:07, 23 March 2026 (UTC)

The discussion above is closed. Please do not modify it. Subsequent comments should be made on the appropriate discussion page. No further edits should be made to this discussion.

Comprehensive architectural and educational resource on ASML Twinscan EXE:5000/5200 and VLSI Manufacturing (Open Access)

Hello everyone,

I am an independent researcher and I have recently published a comprehensive, systematic paper analyzing the global architecture of the ASML Twinscan EXE:5000/5200 High-NA EUV lithography systems and their role in advanced nanometric VLSI manufacturing. The work is fully available in English on Zenodo (Figshare, EngrXiv).

Unlike hyper-specialized academic papers that focus on single components, this open-access work provides a complete, top-down pedagogical overview of the scanner's entire ecosystem. The index of the paper covers:

• Global System Architecture & Vacuum Systems (Chapters 1 & 2)
• Maglev Stage Dynamics & Planar Optical Encoders with Doppler-shift phase demodulation (Chapter 3)
• Reflective EUV Optics, Bragg mirrors, and Anamorphic field geometry/stitching (Chapters 4 & 5)
• Laser-produced plasma (LPP) chemistry, MOPA architecture, and tin droplet synchronization (Chapters 6 & 7)
• Distributed real-time computational infrastructure and FPGA edge routing (Chapter 11)
• Appendices dedicated to VLSI design layout, Optical Proximity Correction (OPC), and Electron Multi-Beam Reticle Writing.

The paper concludes with a three-page interdisciplinary synthesis bridging the historical, philosophical, scientific, and technical dimensions of sub-3nm semiconductor scaling.

As the author, I want to respect Wikipedia's Conflict of Interest guidelines (WP:COI), so I am not editing the main article directly. However, I am sharing this resource here on the Talk page as a potential reference or further reading link for editors looking to enrich the "ASML Holding", "Photolithography", or "High-NA EUV lithography" articles with a well-structured, holistic reference.

• Paper Title: The High-NA EUV Lithography: Architecture and Operation in ASML TwinScan EXE:5000 Systems
• Repository: Zenodo
• DOI: 10.5281/zenodo.20593018

Thank you for your time, your review, and your dedication to this encyclopedia. Attila.ing (talk) 14:56, 21 July 2026 (UTC)